Academy of Finland
Funding decision
 
Name Ritala, Mikko K
Organisation University of Helsinki
Project title Atomic Layer Deposition of Noble Metals and Their Compounds
Decision No. 309552
Decision date 20.06.2017
Funding,period 01.09.2017 - 31.08.2021
Funding 597 980
WebFOCUS Report
Project description
Atomic layer deposition (ALD) is a chemical vapor phase technique for highly controlled growth of thin films. The films grown by ALD have excellent conformality, uniformity, accurate thickness and composition control, and reproducibility. To be able to exploit the unique benefits of ALD, one needs to find proper starting compound combinations for each material of an interest. This project aims to expand the ALD materials and process portfolio by development of new processes for noble metals and their compounds: (i) gold, silver and rhenium ALD processes (ii) non-oxidizing ALD processes for the rest of the noble metals (iii) ALD processes for noble metal compounds other than oxides. Reaction mechanisms in these processes will also be examined, and so will be their suitability for area selective growth. The materials will also be examined in selected applications.